A novel room temperature deposition process for silicon oxide (SiOx) thin films was developed using neutral beam assiste......

Plasma etching is widely used for fabricating semiconductor electronic devices and microelectromechanical systems (MEMS)......

本文采用蒙特卡罗方法的中性束模拟程序NUBEAM结合1.5维托卡马克输运程序ONETWO,模拟了全超导托卡马克EAST一期在建的同向注入和二......